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Amr Y. Abdo, Ph.D. - Publications

Affiliations: 
2003 University of Wisconsin, Madison, Madison, WI 
Area:
Mechanical Engineering
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10 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2004 Abdo AY, Engelstad RL, Beckman WA, Lovell EG. Thermal response of optical reticles: Experimental verification of finite element models Journal of Microlithography, Microfabrication and Microsystems. 3: 232-238. DOI: 10.1117/1.1669489  0.542
2004 Wei AC, Nellis GF, Abdo AY, Engelstad RL, Chen CF, Switkes M, Rothschild M. Microfluidic simulations for immersion lithography Journal of Microlithography, Microfabrication and Microsystems. 3: 28-34. DOI: 10.1117/1.1632500  0.596
2004 Nellis GF, Abdo AY, Engelstad RL, Cotte EP. Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process Journal of Microlithography, Microfabrication and Microsystems. 3: 122-129. DOI: 10.1117/1.1630313  0.406
2004 Abdo A, Schuetter S, Nellis G, Wei A, Engelstad R, Truskett V. Predicting the fluid behavior during the dispensing process for step-and-flash imprint lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3279-3282. DOI: 10.1116/1.1825016  0.446
2004 Abdo A, Nellis G, Wei A, El-Morsi M, Engelstad R, Brueck SRJ, Neumann A. Optimizing the fluid dispensing process for immersion lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3454-3458. DOI: 10.1116/1.1824065  0.528
2004 Wei A, Ei-Morsi M, Nellis G, Abdo A, Engelstad R. Predicting air entrainment due to topography during the filling and scanning process for immersion lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3444-3449. DOI: 10.1116/1.1808736  0.52
2004 Abdo AY, Zheng L, Wei A, Mikkelson A, Nellis G, Engelstad RL, Lovell EG. Simulating fabrication and imprinting distortions in step-and-flash imprint lithography templates Microelectronic Engineering. 73: 161-166. DOI: 10.1016/J.Mee.2004.02.034  0.367
2004 Wei A, Abdo A, Nellis G, Engelstad RL, Chang J, Lovell EG, Beckman W. Modeling fluid thermomechanical response for immersion lithography scanning Microelectronic Engineering. 73: 29-34. DOI: 10.1016/J.Mee.2004.02.011  0.577
2003 Wei A, Abdo A, Nellis G, Engelstad R, Chang J, Lovell E, Beckman W. Simulating fluid flow characteristics during the scanning process for immersion lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2788-2793. DOI: 10.1116/1.1622939  0.583
2002 Cotte EP, Abdo AY, Engelstad RL, Lovell EG. Dynamic studies of hard pellicle response during exposure scanning Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2995-2999. DOI: 10.1116/1.1520573  0.344
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