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Gul B. Basim, Ph.D. - Publications

Affiliations: 
2002 University of Florida, Gainesville, Gainesville, FL, United States 
Area:
Materials Science Engineering
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10 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2018 Cerhan A, Ozdemir Z, Basim GB. Self-Cleaning Ability Quantization of Textiles with Degussa P-25 Materials Science Forum. 915: 129-134. DOI: 10.4028/www.scientific.net/MSF.915.129  0.329
2015 Akbar W, Karagoz A, Basim G, Noor M, Syed T, Lum J, Unluagac M. Nano-boron as an Antibacterial Agent for Functionalized Textiles Mrs Proceedings. 1793: 53-57. DOI: 10.1557/OPL.2015.728  0.496
2015 Karagoz A, Mai J, Basim GB. Understanding selectivity on germanium/SiO2 chemical mechanical planarization through design of experiments Materials Research Society Symposium Proceedings. 1790: 19-24. DOI: 10.1557/opl.2015.524  0.463
2012 Kincal S, Basim G. Impact of Pad Conditioning on Thickness Profile Control in Chemical Mechanical Planarization Journal of Electronic Materials. 42: 83-96. DOI: 10.1007/S11664-012-2250-Z  0.369
2010 Vakarelski IU, Brown SC, Basim GB, Rabinovich YI, Moudgil BM. Tailoring silica nanotribology for CMP slurry optimization: Ca(2+) cation competition in C(12)TAB mediated lubrication. Acs Applied Materials & Interfaces. 2: 1228-35. PMID 20384310 DOI: 10.1021/Am100070E  0.535
2003 Basim GB, Vakarelski IU, Moudgil BM. Role of interaction forces in controlling the stability and polishing performance of CMP slurries. Journal of Colloid and Interface Science. 263: 506-15. PMID 12909041 DOI: 10.1016/S0021-9797(03)00201-7  0.654
2003 Basim GB, Moudgil BM. Slurry Design for Chemical Mechanical Polishing Kona Powder and Particle Journal. 21: 178-184. DOI: 10.14356/kona.2003020  0.641
2002 Basim GB, Moudgil BM. Effect of soft agglomerates on CMP slurry performance Journal of Colloid and Interface Science. 256: 137-142. DOI: 10.1006/jcis.2002.8352  0.44
2002 Basim GB, Vakarelski I, Singh P, Moudgil BM. Engineering the interaction forces to optimize CMP performance Materials Research Society Symposium Proceedings. 732: 73-77.  0.648
2000 Basim GB, Adler JJ, Mahajan U, Singh RK, Moudgil BM. Effect of particle size of chemical mechanical polishing slurries for enhanced polishing with minimal defects Journal of the Electrochemical Society. 147: 3523-3528. DOI: 10.1149/1.1393931  0.528
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