Joseph J. Vegh, Ph.D. - Publications
Affiliations: | 2007 | University of California, Berkeley, Berkeley, CA, United States |
Year | Citation | Score | |||
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2010 | Nest D, Chung TY, Végh JJ, Graves DB, Bruce RL, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG. Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS Journal of Physics D: Applied Physics. 43. DOI: 10.1088/0022-3727/43/8/085204 | 0.674 | |||
2010 | Bruce RL, Weilnboeck F, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Vegh JJ, Nest D, Graves DB. Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films Journal of Applied Physics. 107. DOI: 10.1063/1.3373587 | 0.696 | |||
2009 | Choudhary GK, Végh JJ, Graves DB. Molecular dynamics simulations of oxygen-containing polymer sputtering and the Ohnishi parameter Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/24/242001 | 0.625 | |||
2009 | Végh JJ, Graves DB. Plasma Process. Polym. 5/2009 Plasma Processes and Polymers. 6. DOI: 10.1002/Ppap.200990008 | 0.61 | |||
2009 | Végh JJ, Graves DB. Molecular dynamics simulations of Ar+-organic polymer interactions Plasma Processes and Polymers. 6: 320-334. DOI: 10.1002/Ppap.200800223 | 0.614 | |||
2008 | Végh JJ, Humbird D, Graves DB. Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 52-61. DOI: 10.1116/1.2812444 | 0.655 | |||
2008 | Graves DB, Vegh JJ. Atomistic simulations of feature scale etch profile evolution Aiche Annual Meeting, Conference Proceedings. | 0.445 | |||
2005 | Végh JJ, Humbird D, Graves DB. Silicon etch by fluorocarbon and argon plasmas in the presence of fluorocarbon films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 1598-1604. DOI: 10.1116/1.2049304 | 0.66 | |||
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